说明
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.配置
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM 型号描述
未提供文件
无文件
类别
Lithography
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
145810
晶圆尺寸：
未知
年份：
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HEIDELBERG INSTRUMENTS
DWL 66FS
类别
Lithography
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
145810
晶圆尺寸：
未知
年份：
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.配置
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM 型号描述
未提供文件
无文件