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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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HITACHI HL-7000M
    说明
    E-Beam Litho
    配置
    6" RETICLE MASK LINE
    OEM 型号描述
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    文件

    无文件

    HITACHI

    HL-7000M

    verified-listing-icon

    已验证

    类别
    Lithography

    上次验证: 29 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    115224


    晶圆尺寸:

    12"/300mm


    年份:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography
    年份: 2002状况: 二手
    上次验证29 天前

    HITACHI

    HL-7000M

    verified-listing-icon
    已验证
    类别
    Lithography
    上次验证: 29 天前
    listing-photo-abc5b9ae0acd44d9a2be3d4843d6062c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    115224


    晶圆尺寸:

    12"/300mm


    年份:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    E-Beam Litho
    配置
    6" RETICLE MASK LINE
    OEM 型号描述
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    文件

    无文件

    类似上架物品
    查看全部
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography年份: 2002状况: 二手上次验证:29 天前
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography年份: 0状况: 二手上次验证:60 多天前