说明
无说明配置
无配置OEM 型号描述
Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.文件
无文件
类别
Lithography
上次验证： 18 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
140316
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
JEOL
JBX-6300FS
类别
Lithography
上次验证： 18 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
140316
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.文件
无文件