概述

Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)