说明
Stepper配置
无配置OEM 型号描述
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)文件
无文件
NIKON
FX-601F
已验证
类别
Lithography
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
61726
晶圆尺寸:
未知
年份:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
FX-601F
类别
Lithography
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
61726
晶圆尺寸:
未知
年份:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Stepper配置
无配置OEM 型号描述
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)文件
无文件