说明
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded配置
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEM 型号描述
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.文件
无文件
类别
Lithography
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131301
晶圆尺寸：
未知
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
150 E BEAM
类别
Lithography
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131301
晶圆尺寸：
未知
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded配置
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEM 型号描述
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.文件
无文件