说明
无说明配置
-Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nmOEM 型号描述
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文件
无文件
RAITH
150 TWO
已验证
类别
Lithography
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Idle
产品编号：
114027
晶圆尺寸：
6"/150mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
150 TWO
类别
Lithography
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Idle
产品编号：
114027
晶圆尺寸：
6"/150mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
-Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nmOEM 型号描述
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文件
无文件