说明
Electron-beam lithography system配置
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM 型号描述
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.文件
无文件
RAITH
e-LiNE
类别
Lithography
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
153432
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Electron-beam lithography system配置
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM 型号描述
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.文件
无文件