说明
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras配置
无配置OEM 型号描述
未提供文件
无文件
类别
Lithography
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
148405
晶圆尺寸：
未知
年份：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
ionLINE Plus
类别
Lithography
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
148405
晶圆尺寸：
未知
年份：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras配置
无配置OEM 型号描述
未提供文件
无文件