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说明
EUV mask and mask blank reflectometer (EUV-MBR) Stand-alone EUV mask blank reflectometer Distinctive EUV-MBR properties • Wavelength accuracy better than 2 pm • Small Spot down to < 250 x 100 μm2 • 2000 spectral channels of 1.7 pm width. • Less than 20 seconds exposure time for measuring full spectrum at small spot with full resolution • Precision on CWL_50 < 1 pm • Precision on reflectivity: < 0.1% abs. • Accuracy on reflectivity: < 0.3 % abs. • Resolution limit on absorbers: < 0.1 % • Fiducial mark referenced positioning • Direct quantification of scatter and flare.配置
Spectral range measured < 12.5 to > 14.5 nm Spectral Resolution ≈ 1.7 pm Measured spot size Typ. 250x100 μm2 -- Measured Signal dynamics > 12 bit ➔ From < 0.01 % to > 60% CWL_50 Av. Accuracy: ≤ 3 pm CWL_50 Precision, 3σ ≤ 1 pm Peak Reflectivity Av. Accuracy Rpeak ~ 65% ≤ 0.5 % absolute Peak Reflectivity Precision Rpeak ~ 65%, 3σ ≤ 0.5 %absolute Peak Reflectivity Av. Accuracy Rpeak ~ 1% ≤ 0.05 % absolute Peak Reflectivity : Precision Rpeak ~ 1%: ≤ 0.05%: , 3σ ≤ 0.02% absoluteOEM 型号描述
Our flagship, the EUV-MBR is a stand alone tool for automated characterization of multilayers and absorbers of EUV masks and mask blanks based on our well.文件
无文件
类别
Lithography
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
70399
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RESEARCH INSTRUMENTS
EUV MBR
类别
Lithography
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
70399
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
EUV mask and mask blank reflectometer (EUV-MBR) Stand-alone EUV mask blank reflectometer Distinctive EUV-MBR properties • Wavelength accuracy better than 2 pm • Small Spot down to < 250 x 100 μm2 • 2000 spectral channels of 1.7 pm width. • Less than 20 seconds exposure time for measuring full spectrum at small spot with full resolution • Precision on CWL_50 < 1 pm • Precision on reflectivity: < 0.1% abs. • Accuracy on reflectivity: < 0.3 % abs. • Resolution limit on absorbers: < 0.1 % • Fiducial mark referenced positioning • Direct quantification of scatter and flare.配置
Spectral range measured < 12.5 to > 14.5 nm Spectral Resolution ≈ 1.7 pm Measured spot size Typ. 250x100 μm2 -- Measured Signal dynamics > 12 bit ➔ From < 0.01 % to > 60% CWL_50 Av. Accuracy: ≤ 3 pm CWL_50 Precision, 3σ ≤ 1 pm Peak Reflectivity Av. Accuracy Rpeak ~ 65% ≤ 0.5 % absolute Peak Reflectivity Precision Rpeak ~ 65%, 3σ ≤ 0.5 %absolute Peak Reflectivity Av. Accuracy Rpeak ~ 1% ≤ 0.05 % absolute Peak Reflectivity : Precision Rpeak ~ 1%: ≤ 0.05%: , 3σ ≤ 0.02% absoluteOEM 型号描述
Our flagship, the EUV-MBR is a stand alone tool for automated characterization of multilayers and absorbers of EUV masks and mask blanks based on our well.文件
无文件