说明
无说明配置
Windows based with Suss AL 900 / Autoalign System - Alignment System MA200e TSA - PC -Aut. Adjustment ( Cognex Patmex ) TSA - Lamphouse unit LH 1500 - Suss DVM 8 dual video Microscope ( 2CCD – Cameras /set of rotating Objectives L+R ) - Objective 5x (qty 2) - Objective10x (qty 2) - Objective 20X (qty 2) - Transport Plates ( Kit MA200 / W100-200/Even - Exposure Chuck Prox/Cont W200 - Maskholder MA 200/TL/Prox/Cont/W200 - CIC1200 Lamp Powersupply - Set of Exposure optics Typ A / UV400 - Non Contact Prealigner Station with IR – Sensor - Operators Manual MA 200e English (Digi.) - Optional: Suss Light intensity Meter incl. Probe 405NMOEM 型号描述
200mm production mask aligner cassette-to-cassette with high throughput of up to 170 wafers/hour in first mask mode.文件
无文件
SUSS MicroTec / KARL SUSS
MA200E
已验证
类别
Mask Aligner
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
89625
晶圆尺寸：
8"/200mm
年份：
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SUSS MicroTec / KARL SUSS
MA200E
类别
Mask Aligner
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
89625
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Windows based with Suss AL 900 / Autoalign System - Alignment System MA200e TSA - PC -Aut. Adjustment ( Cognex Patmex ) TSA - Lamphouse unit LH 1500 - Suss DVM 8 dual video Microscope ( 2CCD – Cameras /set of rotating Objectives L+R ) - Objective 5x (qty 2) - Objective10x (qty 2) - Objective 20X (qty 2) - Transport Plates ( Kit MA200 / W100-200/Even - Exposure Chuck Prox/Cont W200 - Maskholder MA 200/TL/Prox/Cont/W200 - CIC1200 Lamp Powersupply - Set of Exposure optics Typ A / UV400 - Non Contact Prealigner Station with IR – Sensor - Operators Manual MA 200e English (Digi.) - Optional: Suss Light intensity Meter incl. Probe 405NMOEM 型号描述
200mm production mask aligner cassette-to-cassette with high throughput of up to 170 wafers/hour in first mask mode.文件
无文件