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说明
1.1 The MPA-600 lithography equipment is second-hand equipment. After debugging, it should meet the requirements of automatic exposure of 6-inch silicon wafers. 1.2 The lighting source is a high-pressure spherical mercury lamp with a spectrum of G/H/I mixed lines. 1.3 The exposure method is 1:1 projection of the pattern on the reticle onto the wafer and exposure in a scanning manner. 1.4 Operation mode: manual and semi-automatic exposure modes, easy to operate and maintain. 1.5 High efficiency and good stability. 1.6 There is sufficient supply of spare parts配置
Mask AlignerOEM 型号描述
The Canon MPA-600FA is a high-throughput mirror projection mask aligner delivers stable performance ideal for VLSI chip production, boasting a 1.5um resolution and +/- 6um depth-of-focus across the entire field for 4”, 5”, and 6” wafers. With field-proven auto alignment via laser scanning, target placement in scribe lines, and seamless compatibility for mix-and-match with steppers, it's a top-tier solution for precision alignments.文件
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CANON
MPA-600FA
类别
Mask/Bond Aligners
上次验证： 24 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127060
晶圆尺寸：
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available