说明
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.配置
无配置OEM 型号描述
未提供文件
无文件
QUINTEL
Q 4000
已验证
类别
Mask/Bond Aligners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Down
产品编号：
103539
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
QUINTEL
Q 4000
类别
Mask/Bond Aligners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Down
产品编号：
103539
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.配置
无配置OEM 型号描述
未提供文件
无文件