概述

Introducing the EXCEED2300AH Ion Implanter - a cutting-edge solution revolutionizing ion implantation. With up to 250kV accelerating voltage, it ensures precise and efficient tasks, removing energy contamination for accurate results. Experience uniformity and beam parallelism with upgraded predictive checking. Rapidly scan up to 300 sheets/hr with high precision. Compatible with 200mm and 300mm wafers for versatile production and research needs.