说明
E-BEAM INSPECTION CU配置
无配置OEM 型号描述
The PROVision 3E system combines nanometer resolution, high speed, and through-layer imaging to produce the millions of datapoints needed to correctly pattern today’s most advanced designs, including 3nm foundry-logic chips, GAA transistors, and next-generation DRAM and 3D NAND. With these capabilities, it sees beyond the blind spots of optical metrology, performing accurate measurements across the wafer and between the many layers of a chip to generate the multidimensional data sets needed to achieve the best chip performance and accelerate time to market.文件
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APPLIED MATERIALS (AMAT)
PROVision
已验证
类别
Metrology
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
73724
晶圆尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部APPLIED MATERIALS (AMAT)
PROVision
类别
Metrology
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
73724
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
E-BEAM INSPECTION CU配置
无配置OEM 型号描述
The PROVision 3E system combines nanometer resolution, high speed, and through-layer imaging to produce the millions of datapoints needed to correctly pattern today’s most advanced designs, including 3nm foundry-logic chips, GAA transistors, and next-generation DRAM and 3D NAND. With these capabilities, it sees beyond the blind spots of optical metrology, performing accurate measurements across the wafer and between the many layers of a chip to generate the multidimensional data sets needed to achieve the best chip performance and accelerate time to market.文件
无文件