概述

The Nanometrics FLX is a flexible metrology system that offers cost-efficiency and high throughput for 300 mm standalone metrology. It is based on Nanometrics’ proven integrated metrology solutions and can support up to four integrated metrology modules simultaneously. The tool can mix-and-match any combination of modules to form a complete metrology solution for lithography, CMP, etch, and CVD/deposition processes. This capability accelerates process development through parallel development of integrated metrology solutions. The system offers industry-leading throughput of 250-500 wafers fueled by dual multi-axis wafer-handling robots.