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SUSS MicroTec / KARL SUSS DSM200
    说明
    Overlay measurement
    配置
    无配置
    OEM 型号描述
    With the DSM200, SUSS MicroTec has developed a new automated metrology system for all emerging front to backside alignment applications. The cassette-cassette front-to-back alignment metrology system is the ideal tool for verifying alignment accuracy on wafers from 2 inch to 200mm. Incorporating state-of-the-art pattern recognition technology, the DSM200 offers the highest measurement accuracy of 0.2 microns at 3 sigma on a fully automated platform with minimized operator intervention. Based on the latest production platform of the SUSS MA200Compact Mask Aligner, the DSM200 provides reliable and accurate metrology for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS devices, power semiconductors and optoelectronics.
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    SUSS MicroTec / KARL SUSS

    DSM200

    verified-listing-icon

    已验证

    类别
    Metrology

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    82039


    晶圆尺寸:

    未知


    年份:

    未知

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    SUSS MicroTec / KARL SUSS DSM200

    SUSS MicroTec / KARL SUSS

    DSM200

    Metrology
    年份: 0状况: 二手
    上次验证60 多天前

    SUSS MicroTec / KARL SUSS

    DSM200

    verified-listing-icon
    已验证
    类别
    Metrology
    上次验证: 60 多天前
    listing-photo-f1b93a49b2ae4c10a4fd55257239aadc-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    82039


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Overlay measurement
    配置
    无配置
    OEM 型号描述
    With the DSM200, SUSS MicroTec has developed a new automated metrology system for all emerging front to backside alignment applications. The cassette-cassette front-to-back alignment metrology system is the ideal tool for verifying alignment accuracy on wafers from 2 inch to 200mm. Incorporating state-of-the-art pattern recognition technology, the DSM200 offers the highest measurement accuracy of 0.2 microns at 3 sigma on a fully automated platform with minimized operator intervention. Based on the latest production platform of the SUSS MA200Compact Mask Aligner, the DSM200 provides reliable and accurate metrology for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS devices, power semiconductors and optoelectronics.
    文件
    类似上架物品
    查看全部
    SUSS MicroTec / KARL SUSS DSM200

    SUSS MicroTec / KARL SUSS

    DSM200

    Metrology年份: 0状况: 二手上次验证: 60 多天前