The Archer 200 is an optical overlay control system designed to meet the performance and cost-of-ownership requirements for advanced design rules, including 32nm and double-patterning lithography. It features major improvements to its core optical design and an optional scatterometry measurement technology. This system offers tighter total measurement uncertainty, increased flexibility, higher productivity, and faster measurement. It uses industry-standard AIM or smaller µAIM targets.

KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

ARCHER 200

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