We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多
说明
Overlaying instrument No missing parts Current Wafer size : 12配置
无配置OEM 型号描述
The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.文件
无文件
类别
Overlay
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
107071
晶圆尺寸：
8"/200mm, 12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
ARCHER AIM+
类别
Overlay
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
107071
晶圆尺寸：
8"/200mm, 12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Overlaying instrument No missing parts Current Wafer size : 12配置
无配置OEM 型号描述
The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.文件
无文件