说明
S200ETCH FILM THICKNESS MEASUREMENT配置
无配置OEM 型号描述
The S200 is a metrology system designed by Rudolph to meet the challenges of high-yield semiconductor production at 0.18μm and below. It offers the industry’s highest repeatability laser-ellipsometer and a High Repeatability Mode (HRM™) for next-generation gates. The system has a 5x10μm measurement spot, the smallest in the industry, allowing for accurate measurements in test structures three times smaller than those required by other systems. Its unique simultaneous multiple angle of incidence ellipsometry provides accurate measurements, resulting in powerful multi-layer film characterization and superior process control. The S200 also has a high wafer-per-hour throughput, nearly twice that of competing ellipsometers, and long 20-30,000 hour laser lifetimes provide unparalleled system-to-system matching, superior repeatability, and significantly lower maintenance.文件
无文件
ONTO / RUDOLPH / AUGUST
S200
已验证
类别
Metrology
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
78357
晶圆尺寸：
8"/200mm
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / RUDOLPH / AUGUST
S200
类别
Metrology
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
78357
晶圆尺寸：
8"/200mm
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
S200ETCH FILM THICKNESS MEASUREMENT配置
无配置OEM 型号描述
The S200 is a metrology system designed by Rudolph to meet the challenges of high-yield semiconductor production at 0.18μm and below. It offers the industry’s highest repeatability laser-ellipsometer and a High Repeatability Mode (HRM™) for next-generation gates. The system has a 5x10μm measurement spot, the smallest in the industry, allowing for accurate measurements in test structures three times smaller than those required by other systems. Its unique simultaneous multiple angle of incidence ellipsometry provides accurate measurements, resulting in powerful multi-layer film characterization and superior process control. The S200 also has a high wafer-per-hour throughput, nearly twice that of competing ellipsometers, and long 20-30,000 hour laser lifetimes provide unparalleled system-to-system matching, superior repeatability, and significantly lower maintenance.文件
无文件