跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
ONTO / RUDOLPH / AUGUST SpectraLASER 200 XL
  • ONTO / RUDOLPH / AUGUST SpectraLASER 200 XL
  • ONTO / RUDOLPH / AUGUST SpectraLASER 200 XL
  • ONTO / RUDOLPH / AUGUST SpectraLASER 200 XL
说明
Film Thickness Measurement System
配置
无配置
OEM 型号描述
The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.
文件

无文件

类别
Metrology

上次验证: 30 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

104576


晶圆尺寸:

8"/200mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ONTO / RUDOLPH / AUGUST

SpectraLASER 200 XL

verified-listing-icon
已验证
类别
Metrology
上次验证: 30 多天前
listing-photo-88c366d2fa174c5dbb22a6d7999573f8-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

104576


晶圆尺寸:

8"/200mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Film Thickness Measurement System
配置
无配置
OEM 型号描述
The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.
文件

无文件