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说明
无说明配置
AIXTRON CCS for GaN Configuration: Wafer Size: 6 x 2" 2 x 4" 1 x 6" Above throughput is possible with current tool configuration. No modifications required. MO Sources: S1 Cp2Mg – 1 S2 Cp2Mg – 2 (spare) S3 TMAl S4 TMGa – 2 S5 TMGa – 1 S6 TMIn – 1 S7 TMIn – 2 (spare) Gases: 100ppm SiH4 NH3 N2 H2 PH3 (for use if converted to III-V) AsH3 (for use if converted to III-V) Installed Parts: showerhead heater Pd cell H2 purifier Epison flow sensors on TMGa and TMIn KSA MiniMOS inisitu high resolution stress monitoring instrument Alcatel glovebox pump Ebara 825 process pump Alcatel regen pump Other Equipment: LLydel chiller for 0°C to 80°C temp control for showerhead Cleansorb SC dry bed abatement systemOEM 型号描述
Close Coupled Showerhead 6x2 inch Deposition system for compound semiconductors文件
无文件
AIXTRON
6x2 CCS
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled / Uncrated
产品编号：
67167
晶圆尺寸：
未知
年份：
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
AIXTRON CCS for GaN Configuration: Wafer Size: 6 x 2" 2 x 4" 1 x 6" Above throughput is possible with current tool configuration. No modifications required. MO Sources: S1 Cp2Mg – 1 S2 Cp2Mg – 2 (spare) S3 TMAl S4 TMGa – 2 S5 TMGa – 1 S6 TMIn – 1 S7 TMIn – 2 (spare) Gases: 100ppm SiH4 NH3 N2 H2 PH3 (for use if converted to III-V) AsH3 (for use if converted to III-V) Installed Parts: showerhead heater Pd cell H2 purifier Epison flow sensors on TMGa and TMIn KSA MiniMOS inisitu high resolution stress monitoring instrument Alcatel glovebox pump Ebara 825 process pump Alcatel regen pump Other Equipment: LLydel chiller for 0°C to 80°C temp control for showerhead Cleansorb SC dry bed abatement systemOEM 型号描述
Close Coupled Showerhead 6x2 inch Deposition system for compound semiconductors文件
无文件