说明
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion Annealing配置
无配置OEM 型号描述
Ceramic Heater Assy文件
无文件
类别
Parts
上次验证： 昨天
物品主要详细信息
状况：
New
运行状况:
Deinstalled
产品编号：
145694
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
0010-03840
类别
Parts
上次验证： 昨天
物品主要详细信息
状况：
New
运行状况:
Deinstalled
产品编号：
145694
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion Annealing配置
无配置OEM 型号描述
Ceramic Heater Assy文件
无文件