说明
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”配置
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM 型号描述
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文件
无文件
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
已验证
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
113547
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
113547
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”配置
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM 型号描述
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文件
无文件