说明
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY配置
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEM 型号描述
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文件
无文件
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
已验证
类别
PECVD
上次验证： 20 天前
物品主要详细信息
状况：
Parts Tool
运行状况:
Deinstalled
产品编号：
113545
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
类别
PECVD
上次验证： 20 天前
物品主要详细信息
状况：
Parts Tool
运行状况:
Deinstalled
产品编号：
113545
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY配置
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEM 型号描述
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文件
无文件