说明
无说明配置
Chemical Vapour Depositioning (CVD - Single)OEM 型号描述
The Applied Producer GT is the industry’s fastest, most cost-effective 300mm CVD platform. Capable of processing 180wph within a very compact footprint, the Producer GT achieves twice the throughput density of any competitive system. Built on the highly successful Producer system, this new platform provides customers with complete process transparency for the full range of PECVD applications for 45nm and beyond while delivering 50% higher system throughput.To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.文件
无文件
类别
PECVD
上次验证： 17 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
129819
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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APPLIED MATERIALS (AMAT)
PRODUCER GT CHAMBER
类别
PECVD
上次验证： 17 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
129819
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Chemical Vapour Depositioning (CVD - Single)OEM 型号描述
The Applied Producer GT is the industry’s fastest, most cost-effective 300mm CVD platform. Capable of processing 180wph within a very compact footprint, the Producer GT achieves twice the throughput density of any competitive system. Built on the highly successful Producer system, this new platform provides customers with complete process transparency for the full range of PECVD applications for 45nm and beyond while delivering 50% higher system throughput.To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.文件
无文件