说明
无说明配置
P-TEOS model and includes DP as well.OEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.文件
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LAM RESEARCH / NOVELLUS
CONCEPT ONE "C1"
已验证
类别
PECVD
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116420
晶圆尺寸：
6"/150mm
年份：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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LAM RESEARCH / NOVELLUS
CONCEPT ONE "C1"
类别
PECVD
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116420
晶圆尺寸：
6"/150mm
年份：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
P-TEOS model and includes DP as well.OEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.文件
无文件