说明
ICP system配置
Dual power supplies/match Designed for high density PECVD of SiO2 and Si3N4 Can be doped with (PH3) for p-glassOEM 型号描述
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文件
无文件
类别
PECVD
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
152873
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 100 PECVD
类别
PECVD
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
152873
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
ICP system配置
Dual power supplies/match Designed for high density PECVD of SiO2 and Si3N4 Can be doped with (PH3) for p-glassOEM 型号描述
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文件
无文件