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说明
无说明配置
PECVD Gases: Ar - 500 sccm NH3 - 50 sccm 5%SiH4/N2 - 1000 sccm CF4 - 500 sccm O2 - 500 sccm N2O - 2000 sccm N2 - 2000 sccm CB1 - Main Circuit Breaker CB2 - PSU CB3 - Not Used CB4 - RF Generator CB5 - LF Generator CB6 - TEOS CB7 - Not Used CB8 - Foreline Heat CB9 - Table Heat CB10 - Chamber Heat CB11 - Pumpdown Heat CB12 - Chamber Pump CB13 - Loadlock Pump CB14 - Not UsedOEM 型号描述
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文件
无文件
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Idle
产品编号：
81699
晶圆尺寸：
未知
年份：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 100
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Idle
产品编号：
81699
晶圆尺寸：
未知
年份：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
PECVD Gases: Ar - 500 sccm NH3 - 50 sccm 5%SiH4/N2 - 1000 sccm CF4 - 500 sccm O2 - 500 sccm N2O - 2000 sccm N2 - 2000 sccm CB1 - Main Circuit Breaker CB2 - PSU CB3 - Not Used CB4 - RF Generator CB5 - LF Generator CB6 - TEOS CB7 - Not Used CB8 - Foreline Heat CB9 - Table Heat CB10 - Chamber Heat CB11 - Pumpdown Heat CB12 - Chamber Pump CB13 - Loadlock Pump CB14 - Not UsedOEM 型号描述
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文件
无文件