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OXFORD PLASMALAB 100
    说明
    无说明
    配置
    PECVD Gases: Ar - 500 sccm NH3 - 50 sccm 5%SiH4/N2 - 1000 sccm CF4 - 500 sccm O2 - 500 sccm N2O - 2000 sccm N2 - 2000 sccm CB1 - Main Circuit Breaker CB2 - PSU CB3 - Not Used CB4 - RF Generator CB5 - LF Generator CB6 - TEOS CB7 - Not Used CB8 - Foreline Heat CB9 - Table Heat CB10 - Chamber Heat CB11 - Pumpdown Heat CB12 - Chamber Pump CB13 - Loadlock Pump CB14 - Not Used
    OEM 型号描述
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    文件

    无文件

    OXFORD

    PLASMALAB 100

    verified-listing-icon

    已验证

    类别
    PECVD

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    Installed / Idle


    产品编号:

    81699


    晶圆尺寸:

    未知


    年份:

    2011


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD
    年份: 0状况: 二手
    上次验证15 天前

    OXFORD

    PLASMALAB 100

    verified-listing-icon
    已验证
    类别
    PECVD
    上次验证: 60 多天前
    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/2122157b8b534a4caadb38a679c80b8d_f18883db8295412b87e122592e345232_mw.jpeg
    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/12dba54a4a0a493c83f89220b7e79ff6_1f8484b63085410ea82f3a241d5f6553_mw.jpeg
    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/5a4480378d8647638574ecd1e184b9a0_7ef374e3d5d246ada3b183ef137ff484_mw.jpeg
    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/9be7386faead41569981c3ef8593ed18_efe986b3c280435085f852d8bd7250f21201a_mw.jpeg
    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/d25fd5368241469fa75fd648ab17d014_bffb65934b8a4e59a410eb64f4336ce51201a_mw.jpeg
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    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/3e50171efcf34f6e87068a6ce2d727e9_5eecbf6b806c46f7b931c135871d09801201a_mw.jpeg
    listing-photo-a474ce9fe7404445be0c661a7c573a35-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73024/a474ce9fe7404445be0c661a7c573a35/dd44921c9c064a789e42227f448b9963_7268e49305e9479baebe593330ddfd64_mw.jpeg
    物品主要详细信息

    状况:

    Used


    运行状况:

    Installed / Idle


    产品编号:

    81699


    晶圆尺寸:

    未知


    年份:

    2011


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    PECVD Gases: Ar - 500 sccm NH3 - 50 sccm 5%SiH4/N2 - 1000 sccm CF4 - 500 sccm O2 - 500 sccm N2O - 2000 sccm N2 - 2000 sccm CB1 - Main Circuit Breaker CB2 - PSU CB3 - Not Used CB4 - RF Generator CB5 - LF Generator CB6 - TEOS CB7 - Not Used CB8 - Foreline Heat CB9 - Table Heat CB10 - Chamber Heat CB11 - Pumpdown Heat CB12 - Chamber Pump CB13 - Loadlock Pump CB14 - Not Used
    OEM 型号描述
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    文件

    无文件

    类似上架物品
    查看全部
    OXFORD PLASMALAB 100

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    PECVD年份: 0状况: 二手上次验证:15 天前
    OXFORD PLASMALAB 100

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    OXFORD PLASMALAB 100

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    PECVD年份: 0状况: 二手上次验证:30 多天前