概述

The Oxford PLASMALAB 133 ICP 380 is a type of Ion Couple Plasma Etching System that features a 380 ICP Source. This system is designed with a manual load lock and a ceramic clamp style. It comes with an Alcatel Turbo pump and controller, a VAT Gate Valve and PM5 controller, an Endpoint Detector, and an RF power supply with match work and tuner. Additionally, it has eight Mass Flow Controllers.