说明
450mm wafer capable, Load-Lock Chamber配置
Oxford PlasmaPro NGP1000 PECVD - Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4000 Control Software - X20 PLC - 490mm Diameter Aluminum Lower Electrode - Capable of running up 450mm wafers - Up to 400 degrees Celcius - Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition) - Dual Frequency RF with Pulsing for Film Stress Control - 600W 13.56Mhz HF RF Generator - 600W 2Mhz LF RF Generator - Pneumatic Chamber Lift Kit - Adixen ADS602P Dry Pump for Process Chamber - Adixen ACP40G for Load Lock - Operations Manual and Documentation X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: - He - CF4 - N2 - N20 - NH3 - SiH4-N2OEM 型号描述
The PlasmaPro NGP1000 from Oxford Instruments is a tool that uses plasma etching and deposition to deposit layers of SiO2 and SiNx. It is part of the PlasmaPro NGP1000 HBLED series of tools. The system features a large electrode and a specially designed showerhead, which allows it to accommodate up to 61 x 2”, 15 x 4” or 7 x 6” wafers at once. This tool is specifically designed to provide exceptional advantages for manufacturers of HBLEDs.文件
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OXFORD
PLASMAPRO NGP1000
已验证
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
77527
晶圆尺寸：
15"/450mm
年份：
2012
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
PLASMAPRO NGP1000
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
77527
晶圆尺寸：
15"/450mm
年份：
2012
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
450mm wafer capable, Load-Lock Chamber配置
Oxford PlasmaPro NGP1000 PECVD - Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4000 Control Software - X20 PLC - 490mm Diameter Aluminum Lower Electrode - Capable of running up 450mm wafers - Up to 400 degrees Celcius - Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition) - Dual Frequency RF with Pulsing for Film Stress Control - 600W 13.56Mhz HF RF Generator - 600W 2Mhz LF RF Generator - Pneumatic Chamber Lift Kit - Adixen ADS602P Dry Pump for Process Chamber - Adixen ACP40G for Load Lock - Operations Manual and Documentation X20 External Gas Box with up to 12 Gas Lines. Currently Configured for: - He - CF4 - N2 - N20 - NH3 - SiH4-N2OEM 型号描述
The PlasmaPro NGP1000 from Oxford Instruments is a tool that uses plasma etching and deposition to deposit layers of SiO2 and SiNx. It is part of the PlasmaPro NGP1000 HBLED series of tools. The system features a large electrode and a specially designed showerhead, which allows it to accommodate up to 61 x 2”, 15 x 4” or 7 x 6” wafers at once. This tool is specifically designed to provide exceptional advantages for manufacturers of HBLEDs.文件
无文件