说明
无说明配置
Process: RIE nitride and oxide. LoadLock: holds 2 cassettes and has a transfer chamber between the 2 process chambers Materials Exposure: Gas and Silicon wafers. Cortex Computer upgrade and software Dual chamber etcher. Has the vortex computer upgrade. System currently installed in Fab and running. 3 Edwards iQDP80 pumps and 2 Neslab chillers.OEM 型号描述
未提供文件
无文件
PLASMATHERM / UNAXIS
VERSALOCK 700
已验证
类别
PECVD
上次验证： 28 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105078
晶圆尺寸：
4"/100mm, 6"/150mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PLASMATHERM / UNAXIS
VERSALOCK 700
类别
PECVD
上次验证： 28 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105078
晶圆尺寸：
4"/100mm, 6"/150mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Process: RIE nitride and oxide. LoadLock: holds 2 cassettes and has a transfer chamber between the 2 process chambers Materials Exposure: Gas and Silicon wafers. Cortex Computer upgrade and software Dual chamber etcher. Has the vortex computer upgrade. System currently installed in Fab and running. 3 Edwards iQDP80 pumps and 2 Neslab chillers.OEM 型号描述
未提供文件
无文件