说明
无说明配置
ExposureOEM 型号描述
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.文件
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VEECO / ULTRATECH
SATURN SPECTRUM 3e
已验证
类别
Photolithography
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
64159
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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VEECO / ULTRATECH
SATURN SPECTRUM 3e
类别
Photolithography
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
64159
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
2005
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
ExposureOEM 型号描述
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.文件
无文件