说明
Mostly used for NPI products配置
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM 型号描述
未提供文件
无文件
类别
PVD / Sputtering
上次验证： 7 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
143004
晶圆尺寸：
未知
年份：
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AJA INTERNATIONAL, INC
ATC-ORION 8
类别
PVD / Sputtering
上次验证： 7 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
143004
晶圆尺寸：
未知
年份：
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Mostly used for NPI products配置
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM 型号描述
未提供文件
无文件