说明
无说明配置
AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CHOEM 型号描述
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文件
无文件
APPLIED MATERIALS (AMAT)
ENDURA II
已验证
类别
PVD / Sputtering
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116997
晶圆尺寸：
12"/300mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
ENDURA II
类别
PVD / Sputtering
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116997
晶圆尺寸：
12"/300mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
AL 2CH, TTN 1CH, SIP 2CH, ALPS 1CH, PcXT 1CH, Degas (STD) 2CHOEM 型号描述
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文件
无文件