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TEL / MRC ECLIPSE MARK IV
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Eclipse Mark IV is the latest generation PVD tool from the highly successful Eclipse family. It offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance. The system achieves high throughput in a high vacuum environment through the use of serial wafer handling, resulting in 80% fewer wafer transfers than a traditional cluster tool. The Eclipse Mark IV has a footprint of 44 square feet and can be configured for etch or deposition, providing full capability for today’s contact, barrier, interconnect, resistor, and packaging films for Silicon, GaAs and CCD substrates. Wafer temperature is regulated by backplane heaters and the chambers have world class vacuum leak rates and base pressures.
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    TEL / MRC

    ECLIPSE MARK IV

    verified-listing-icon

    已验证

    类别
    PVD / Sputtering

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    79338


    晶圆尺寸:

    6"/150mm


    年份:

    未知

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    类似上架物品
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    TEL / MRC ECLIPSE MARK IV

    TEL / MRC

    ECLIPSE MARK IV

    PVD / Sputtering
    年份: 1998状况: 二手
    上次验证30 多天前

    TEL / MRC

    ECLIPSE MARK IV

    verified-listing-icon
    已验证
    类别
    PVD / Sputtering
    上次验证: 60 多天前
    listing-photo-749182e1d9d54a3e8af71f29c61f3637-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    79338


    晶圆尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Eclipse Mark IV is the latest generation PVD tool from the highly successful Eclipse family. It offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance. The system achieves high throughput in a high vacuum environment through the use of serial wafer handling, resulting in 80% fewer wafer transfers than a traditional cluster tool. The Eclipse Mark IV has a footprint of 44 square feet and can be configured for etch or deposition, providing full capability for today’s contact, barrier, interconnect, resistor, and packaging films for Silicon, GaAs and CCD substrates. Wafer temperature is regulated by backplane heaters and the chambers have world class vacuum leak rates and base pressures.
    文件

    无文件

    类似上架物品
    查看全部
    TEL / MRC ECLIPSE MARK IV

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    PVD / Sputtering年份: 1998状况: 二手上次验证: 30 多天前
    TEL / MRC ECLIPSE MARK IV

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    ECLIPSE MARK IV

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    TEL / MRC ECLIPSE MARK IV

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    ECLIPSE MARK IV

    PVD / Sputtering年份: 0状况: 二手上次验证: 60 多天前