说明
DC magnetron Sputter, RF magnetron Sputter 1-3 of cathode. Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode small sample to 8 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter function配置
Efficient 8″ round cathodes High throughput operation High Uniformity DC, RF Etch and Bias operation Ultra Clean vacuum system Load lock operation UHV design Flexible for development or production use Substrates up to 6″ diameter Various pumping and power options RF/RF co-sputtering option Optional gas controllersOEM 型号描述
The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes.文件
无文件
类别
PVD / Sputtering
上次验证： 20 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138432
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PERKIN ELMER
4450
类别
PVD / Sputtering
上次验证： 20 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138432
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
DC magnetron Sputter, RF magnetron Sputter 1-3 of cathode. Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode small sample to 8 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter function配置
Efficient 8″ round cathodes High throughput operation High Uniformity DC, RF Etch and Bias operation Ultra Clean vacuum system Load lock operation UHV design Flexible for development or production use Substrates up to 6″ diameter Various pumping and power options RF/RF co-sputtering option Optional gas controllersOEM 型号描述
The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes.文件
无文件