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说明
PVD (Physical Vapor Deposition)配置
Software Version: Ver. 332-A2 System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz Loading Configuration: 3 Load Ports Chm Position F1 PVD Sputter ( 3C ) AR, N2 Chm Position F2 PVD Sputter ( 3C ) AR, N2 Chm Position F4 PVD Sputter ( 3C ) AR, N2 Chm Position B1/B2 Degas Chambers F1,F2,F4 - PVD Chambers ( 3C Sputter process ) B1/B2 - Degas Chambers (Remove moist layer ) System is not configured with substrate bias. System utilizes AE MDX 1KOEM 型号描述
未提供文件
无文件
类别
PVD / Sputtering
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
48141
晶圆尺寸：
12"/300mm
年份：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ULVAC
ENTRON-EX W300
类别
PVD / Sputtering
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
48141
晶圆尺寸：
12"/300mm
年份：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
PVD (Physical Vapor Deposition)配置
Software Version: Ver. 332-A2 System Power Rating: 3 Phase,AC200V,80A/102A/63A 50/60 Hz Loading Configuration: 3 Load Ports Chm Position F1 PVD Sputter ( 3C ) AR, N2 Chm Position F2 PVD Sputter ( 3C ) AR, N2 Chm Position F4 PVD Sputter ( 3C ) AR, N2 Chm Position B1/B2 Degas Chambers F1,F2,F4 - PVD Chambers ( 3C Sputter process ) B1/B2 - Degas Chambers (Remove moist layer ) System is not configured with substrate bias. System utilizes AE MDX 1KOEM 型号描述
未提供文件
无文件