二手 APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT 设备

市场 > Deposition > APPLIED MATERIALS (AMAT) > CENTURA AP ISPRINT

CENTURA AP ISPRINT

类别

概述

Employing a unique, “selective” suppression mechanism, the Centura® iSprint™ ALD/CVD SSW process delivers the industry’s first bottom-up CVD W gap fill, free of voids and seams. It optimizes the volume of W, creating more robust features and helping to improve yield.

活动的上架物品

服务

检验、保险、评估、物流

We value your privacy

CENTURA AP ISPRINT

类别

概述

活动的上架物品

服务

热门上架物品

APPLIED MATERIALS (AMAT)

CENTURA AP ISPRINT

APPLIED MATERIALS (AMAT)

CENTURA AP ISPRINT

APPLIED MATERIALS (AMAT)

CENTURA AP ISPRINT

使用 Moov 上架，立即找到完美买家。