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KLA RS75
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The OmniMap RS75 is a four-point probe series that offers precise sheet resistance measurements for monitor wafers. It is faster than existing systems and is suitable for a variety of semiconductor process monitoring applications, including ion implantation, metal deposition, CMP, diffusion, polysilicon, epi, RTP, and bulk silicon. The system can process over 100 wafers per hour when conducting a five-site test on 200 mm wafers, with temperature compensation and flat alignment. A 49-site contour map with temperature compensation can be completed on a manually loaded test wafer in less than sixty seconds. This makes the OmniMap RS75 a production-worthy tool for sheet resistance mapping.
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    verified-listing-icon

    已验证

    类别
    Resistivity / Four Point Probe

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    118093


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    KLA

    RS75

    verified-listing-icon
    已验证
    类别
    Resistivity / Four Point Probe
    上次验证: 60 多天前
    listing-photo-532da7ff6b85449e83a8f7842fc00c31-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    118093


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The OmniMap RS75 is a four-point probe series that offers precise sheet resistance measurements for monitor wafers. It is faster than existing systems and is suitable for a variety of semiconductor process monitoring applications, including ion implantation, metal deposition, CMP, diffusion, polysilicon, epi, RTP, and bulk silicon. The system can process over 100 wafers per hour when conducting a five-site test on 200 mm wafers, with temperature compensation and flat alignment. A 49-site contour map with temperature compensation can be completed on a manually loaded test wafer in less than sixty seconds. This makes the OmniMap RS75 a production-worthy tool for sheet resistance mapping.
    文件

    无文件