说明
lon concentration No missing parts Current Wafer size : 8配置
无配置OEM 型号描述
The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.文件
无文件
KLA / THERMA-WAVE
TP-420
已验证
类别
Reticle / Mask Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
107110
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA / THERMA-WAVE
TP-420
类别
Reticle / Mask Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
107110
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
lon concentration No missing parts Current Wafer size : 8配置
无配置OEM 型号描述
The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.文件
无文件