说明
Defect Detection配置
Software Version: 4.2.24 Process: Reticle InspectionOEM 型号描述
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.文件
无文件
KLA
SL301
类别
Reticle / Mask Inspection
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
153866
晶圆尺寸：
12"/300mm
年份：
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Defect Detection配置
Software Version: 4.2.24 Process: Reticle InspectionOEM 型号描述
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.文件
无文件