说明
Others Reticle handler 1 Handler System Internal Transfer Unit 1 Main System MASK INSPECTION SYSTEM 1配置
Software Version SL4.2.24OEM 型号描述
The KLA-Tencor STARlight™ SL3UV is a product that provides comprehensive UV contamination inspection for deep ultra-violet (DUV) lithography. It assures reticle quality throughout the manufacturing process and their productive life in wafer fabrication. This is necessary due to the increased complexity of reticle manufacturing and new inspection challenges introduced by subwavelength lithography.文件
无文件
类别
Reticle / Mask Inspection
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
144643
晶圆尺寸：
8"/200mm
年份：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
SL3UV URSA
类别
Reticle / Mask Inspection
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
144643
晶圆尺寸：
8"/200mm
年份：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Others Reticle handler 1 Handler System Internal Transfer Unit 1 Main System MASK INSPECTION SYSTEM 1配置
Software Version SL4.2.24OEM 型号描述
The KLA-Tencor STARlight™ SL3UV is a product that provides comprehensive UV contamination inspection for deep ultra-violet (DUV) lithography. It assures reticle quality throughout the manufacturing process and their productive life in wafer fabrication. This is necessary due to the increased complexity of reticle manufacturing and new inspection challenges introduced by subwavelength lithography.文件
无文件