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说明
Lamp annealer配置
无配置OEM 型号描述
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.文件
无文件
PREFERRED
SELLER
类别
RTP/RTA
上次验证： 60 多天前
Buyer pays 12% premium of final sale price
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
121059
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PREFERRED
SELLER
APPLIED MATERIALS (AMAT)
CENTURA RTP
类别
RTP/RTA
上次验证： 60 多天前
Buyer pays 12% premium of final sale price
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
121059
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Lamp annealer配置
无配置OEM 型号描述
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.文件
无文件