说明
Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases配置
无配置OEM 型号描述
未提供文件
无文件
MATTSON / STEAG / AST
HEATPULSE 2101
已验证
类别
RTP/RTA
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
16249
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATTSON / STEAG / AST
HEATPULSE 2101
类别
RTP/RTA
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
16249
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Rapid Thermal Processing System for 3 Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying Cassette to Cassette Handling of 3”-5” Wafers Microprocessor-controlled 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle 400-1150ºC Steady-State Temperature Range 1-300 Seconds Anneal Time Controlled Ambient for up to 4 Gases配置
无配置OEM 型号描述
未提供文件
无文件