说明
Additional Options Additional MultiChem GIS chemistries: IEE, EE, Pt, W, C Integrated EDS and EBSD detectors配置
Helios 450HP (upgraded to a G3 system) Elstar UC Electron Column Electron beam range: 350 V to 30 kV Tomahawk Ion Column Ion beam voltage: 0.5 to 30 kV Beam current: 1 pA to 65 nA TLD, ETD, and ICE detectors EasyLift with rotation MultiChem GIS with Pt or W included Integrated plasma cleaner Full Piezo UHR stage Windows 7 and XT 10 Installation and operation training includedOEM 型号描述
The 450HP and 1200HP DualBeam systems include new capability that meets the critical requirements for semiconductor process development at the 28nm device geometry node and below. The 450HP model can accommodate samples up to 100mm wafers.文件
无文件
类别
SEM / FIB
上次验证： 15 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150314
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILIPS
HELIOS NANOLAB 450HP
类别
SEM / FIB
上次验证： 15 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150314
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Additional Options Additional MultiChem GIS chemistries: IEE, EE, Pt, W, C Integrated EDS and EBSD detectors配置
Helios 450HP (upgraded to a G3 system) Elstar UC Electron Column Electron beam range: 350 V to 30 kV Tomahawk Ion Column Ion beam voltage: 0.5 to 30 kV Beam current: 1 pA to 65 nA TLD, ETD, and ICE detectors EasyLift with rotation MultiChem GIS with Pt or W included Integrated plasma cleaner Full Piezo UHR stage Windows 7 and XT 10 Installation and operation training includedOEM 型号描述
The 450HP and 1200HP DualBeam systems include new capability that meets the critical requirements for semiconductor process development at the 28nm device geometry node and below. The 450HP model can accommodate samples up to 100mm wafers.文件
无文件