说明
Cold Field Emission High Resolution Automation: Auto-alignment and auto-focus technology. Control Interface: PC-based operation - Windows 2000配置
Electron Gun: Cold Field Emission (FE) gun. Resolution: High Vacuum: 1.5 nm at 15 kV. Low Voltage: 5.0 nm at 1.0 kV. Acceleration Voltage: 0.5 kV to 30 kV (0.1 kV steps). Magnification: 20x to 500,000x. Specimen Chamber Vacuum: High Vacuum Mode: < 10^-3Pa. Specimen Stage: Type: 5-axis eucentric stage. Traverse: X: 0 - 100 mm, Y: 0 - 50 mm, Z: 5-30 mm. Rotation/Tilt: 360° rotation; -5 to +60° tilt. Detector Systems: Standard Secondary Electron (SE) detector. Imaging & Analysis: Compatible with Energy Dispersive X-ray Spectroscopy (EDS/EDX). Compatible with Electron Backscatter Diffraction (EBSD). Image processing tools (e.g., Quartz PCI).OEM 型号描述
The Hitachi S-4300 E/N (FESEM), with guaranteed 1.5 nm resolution at 15 kV (5.0 nm at 1.0 kV), combines both high resolution and variable pressure into a single instrument.文件
无文件
HITACHI
S-4300
类别
SEM / FIB
上次验证： 2 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
146124
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Cold Field Emission High Resolution Automation: Auto-alignment and auto-focus technology. Control Interface: PC-based operation - Windows 2000配置
Electron Gun: Cold Field Emission (FE) gun. Resolution: High Vacuum: 1.5 nm at 15 kV. Low Voltage: 5.0 nm at 1.0 kV. Acceleration Voltage: 0.5 kV to 30 kV (0.1 kV steps). Magnification: 20x to 500,000x. Specimen Chamber Vacuum: High Vacuum Mode: < 10^-3Pa. Specimen Stage: Type: 5-axis eucentric stage. Traverse: X: 0 - 100 mm, Y: 0 - 50 mm, Z: 5-30 mm. Rotation/Tilt: 360° rotation; -5 to +60° tilt. Detector Systems: Standard Secondary Electron (SE) detector. Imaging & Analysis: Compatible with Energy Dispersive X-ray Spectroscopy (EDS/EDX). Compatible with Electron Backscatter Diffraction (EBSD). Image processing tools (e.g., Quartz PCI).OEM 型号描述
The Hitachi S-4300 E/N (FESEM), with guaranteed 1.5 nm resolution at 15 kV (5.0 nm at 1.0 kV), combines both high resolution and variable pressure into a single instrument.文件
无文件