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市场 > I-Line > NIKON > NSR-2205i14E2

NSR-2205i14E2

类别
I-Line
概述

For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).

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