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NIKON NSR-2205i14E2
    说明
    Resolution =0.35um Long Term Focus Stability Within + 0.2um 0. 4um pattern(CE) Average Value from previous days="3" 0. 4um Magnification Control Vs. Lens Heating Within 0. 02um NIKON standard LC Test Condition (Heat & Cool Test) Auto focus repeatability +0. 1um Total Focus Deviation 0.0 35um 0. 4um V/H pattern 5pts 0. 4um V/H 5 Lens distortion Within +0.05um Max expose filed 22.0x22.0mm 3days 3 measurement 3 Reticle blind setting accuracy +0. 4 to +0. 8mm on reticle NIKON standard Test Condition Exposure power 650mw/cm2 new lamp Integrated exposure control within I 1.0% input time: 100msec 200msec 400msec Illumination uniformity Within 1.4% 3 times measurement with exposure area Reticle rotation +3o<20um Nikon standard Test condition Nikon Array orthogonality Within +0. 1sec After software compensation After software compensation Stepping precision Within 0. 45um (3g) Nikon standard test Nikon standard test Alignment accuracy (1) LSA (2) FIA (1) M +3o<0.06 (2) M +3o<0.065 10 points EGA 10 points EGA Stepping rate 27sec or less (150mm) Exposure time: 130msec Exposure time: 130msec Wafer pre-alignment 2 repeatability 3g <15um 20 times measurement for x,y and 6 on same wafer times measurement for x,y and 6 on same wafer Chip leveling accuracy Within +1. 5sec 10 times measurement 10 times measurement Wafer System Operation Test >99% 200Wafers 200Wafers Reticle System Operation Test 100% Each 1 time for every slot 1 time for every slot Wafer flatness 2. 5um Nikon standard test Nikon standard test
    配置
    See attachment in Documents
    OEM 型号描述
    For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
    文件

    NIKON

    NSR-2205i14E2

    verified-listing-icon

    已验证

    类别
    Steppers & Scanners

    上次验证: 30 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    114967


    晶圆尺寸:

    8"/200mm


    年份:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scanners
    年份: 0状况: 翻新
    上次验证12 天前

    NIKON

    NSR-2205i14E2

    verified-listing-icon
    已验证
    类别
    Steppers & Scanners
    上次验证: 30 天前
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    114967


    晶圆尺寸:

    8"/200mm


    年份:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Resolution =0.35um Long Term Focus Stability Within + 0.2um 0. 4um pattern(CE) Average Value from previous days="3" 0. 4um Magnification Control Vs. Lens Heating Within 0. 02um NIKON standard LC Test Condition (Heat & Cool Test) Auto focus repeatability +0. 1um Total Focus Deviation 0.0 35um 0. 4um V/H pattern 5pts 0. 4um V/H 5 Lens distortion Within +0.05um Max expose filed 22.0x22.0mm 3days 3 measurement 3 Reticle blind setting accuracy +0. 4 to +0. 8mm on reticle NIKON standard Test Condition Exposure power 650mw/cm2 new lamp Integrated exposure control within I 1.0% input time: 100msec 200msec 400msec Illumination uniformity Within 1.4% 3 times measurement with exposure area Reticle rotation +3o<20um Nikon standard Test condition Nikon Array orthogonality Within +0. 1sec After software compensation After software compensation Stepping precision Within 0. 45um (3g) Nikon standard test Nikon standard test Alignment accuracy (1) LSA (2) FIA (1) M +3o<0.06 (2) M +3o<0.065 10 points EGA 10 points EGA Stepping rate 27sec or less (150mm) Exposure time: 130msec Exposure time: 130msec Wafer pre-alignment 2 repeatability 3g <15um 20 times measurement for x,y and 6 on same wafer times measurement for x,y and 6 on same wafer Chip leveling accuracy Within +1. 5sec 10 times measurement 10 times measurement Wafer System Operation Test >99% 200Wafers 200Wafers Reticle System Operation Test 100% Each 1 time for every slot 1 time for every slot Wafer flatness 2. 5um Nikon standard test Nikon standard test
    配置
    See attachment in Documents
    OEM 型号描述
    For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
    文件
    类似上架物品
    查看全部
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scanners年份: 0状况: 翻新上次验证:12 天前
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scanners年份: 2006状况: 二手上次验证:30 天前
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scanners年份: 2007状况: 二手上次验证:60 多天前