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NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
  • NIKON NSR-2205i14E2
说明
Resolution =0.35um Long Term Focus Stability Within + 0.2um 0. 4um pattern(CE) Average Value from previous days="3" 0. 4um Magnification Control Vs. Lens Heating Within 0. 02um NIKON standard LC Test Condition (Heat & Cool Test) Auto focus repeatability +0. 1um Total Focus Deviation 0.0 35um 0. 4um V/H pattern 5pts 0. 4um V/H 5 Lens distortion Within +0.05um Max expose filed 22.0x22.0mm 3days 3 measurement 3 Reticle blind setting accuracy +0. 4 to +0. 8mm on reticle NIKON standard Test Condition Exposure power 650mw/cm2 new lamp Integrated exposure control within I 1.0% input time: 100msec 200msec 400msec Illumination uniformity Within 1.4% 3 times measurement with exposure area Reticle rotation +3o<20um Nikon standard Test condition Nikon Array orthogonality Within +0. 1sec After software compensation After software compensation Stepping precision Within 0. 45um (3g) Nikon standard test Nikon standard test Alignment accuracy (1) LSA (2) FIA (1) M +3o<0.06 (2) M +3o<0.065 10 points EGA 10 points EGA Stepping rate 27sec or less (150mm) Exposure time: 130msec Exposure time: 130msec Wafer pre-alignment 2 repeatability 3g <15um 20 times measurement for x,y and 6 on same wafer times measurement for x,y and 6 on same wafer Chip leveling accuracy Within +1. 5sec 10 times measurement 10 times measurement Wafer System Operation Test >99% 200Wafers 200Wafers Reticle System Operation Test 100% Each 1 time for every slot 1 time for every slot Wafer flatness 2. 5um Nikon standard test Nikon standard test
配置
See attachment in Documents
OEM 型号描述
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
文件
类别
Steppers & Scanners

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

114967


晶圆尺寸:

8"/200mm


年份:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

NIKON

NSR-2205i14E2

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已验证
类别
Steppers & Scanners
上次验证: 60 多天前
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物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

114967


晶圆尺寸:

8"/200mm


年份:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Resolution =0.35um Long Term Focus Stability Within + 0.2um 0. 4um pattern(CE) Average Value from previous days="3" 0. 4um Magnification Control Vs. Lens Heating Within 0. 02um NIKON standard LC Test Condition (Heat & Cool Test) Auto focus repeatability +0. 1um Total Focus Deviation 0.0 35um 0. 4um V/H pattern 5pts 0. 4um V/H 5 Lens distortion Within +0.05um Max expose filed 22.0x22.0mm 3days 3 measurement 3 Reticle blind setting accuracy +0. 4 to +0. 8mm on reticle NIKON standard Test Condition Exposure power 650mw/cm2 new lamp Integrated exposure control within I 1.0% input time: 100msec 200msec 400msec Illumination uniformity Within 1.4% 3 times measurement with exposure area Reticle rotation +3o<20um Nikon standard Test condition Nikon Array orthogonality Within +0. 1sec After software compensation After software compensation Stepping precision Within 0. 45um (3g) Nikon standard test Nikon standard test Alignment accuracy (1) LSA (2) FIA (1) M +3o<0.06 (2) M +3o<0.065 10 points EGA 10 points EGA Stepping rate 27sec or less (150mm) Exposure time: 130msec Exposure time: 130msec Wafer pre-alignment 2 repeatability 3g <15um 20 times measurement for x,y and 6 on same wafer times measurement for x,y and 6 on same wafer Chip leveling accuracy Within +1. 5sec 10 times measurement 10 times measurement Wafer System Operation Test >99% 200Wafers 200Wafers Reticle System Operation Test 100% Each 1 time for every slot 1 time for every slot Wafer flatness 2. 5um Nikon standard test Nikon standard test
配置
See attachment in Documents
OEM 型号描述
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
文件