PAS 5500/1100B
概述
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.
活动的上架物品
0
服务
检验、保险、评估、物流
热门上架物品
- 未找到产品